| Page | | Article title | | Author(s) |
|---|
| 1995-1996 |
|
Device Photolithography: Forward |
|
Blecher, Franklin H. |
| 1997-2009 |
|
Device Photolithography: An Overview of the New Mask-Making System |
|
Howland, F.L.; Poole, K.M. |
| 2011-2029 |
|
Device Photolithography: Computer Systems for Pattern Generator Control |
|
Gross, A.G.; Raamot, J.; Watkins, Mrs. S.B. |
| 2031 |
|
Device Photolithography: The Primary Pattern Generator: Introduction |
|
Poole, K.M. |
| 2033-2041 |
|
Device Photolithography: The Primary Pattern Generator - Part I - OpticalDesign |
|
Cowan, M.J.; Herriott, D.R.; Johnson, A.M.; Zacharias, A. |
| 2043-2059 |
|
Device Photolithography: The Primary Pattern Generator: Part II: MechanicalDesign |
|
Kossyk, G.J.W.; Laico, J.P.; Rongved, L.; Stafford, J.W. |
| 2061-2067 |
|
Device Photolithography: The Primary Pattern Generator: Part III: TheControl System |
|
Dowd, P.G.; Cowan, M.J.; Rosenfeld, P.E.; Zacharias, A. |
| 2069-2075 |
|
Device Photolithography: The Primary Pattern Generator: Part IV: Alignment and Performance Evaluation |
|
Johnson, A.M.; Zacharias, A. |
| 2077-2094 |
|
Device Photolithography: The Electron Beam Pattern Generator |
|
Samaroo, W.; Raamot, J.; Parry, P.; Robertson, G. |
| 2095-2104 |
|
Device Photolithography: Electron-Sensitive Materials |
|
Broyde, Barret |
| 2105-2116 |
|
Device Photolithography: Lenses for the Photolithographic System |
|
Herriott, Donald R. |
| 2117-2128 |
|
Device Photolithography: Reduction Cameras: Optical Design and Adjustment |
|
Rawson, Eric G. |
| 2129-2143 |
|
Device Photolithography: Reduction Cameras: Mechanical Design of the 3.5Xand 1.4X Reduction Cameras |
|
Poulsen, M.E.; Stafford, J.W. |
| 2145-2177 |
|
Device Photolithography: The Step-and-Repeat Camera |
|
Alles, D.S.; Elek, J.W.; Howland, F.L.; Nevis, B.; Nielsen, R.J.; Schlegel, W.A.; Skinner, J.G.; Stout, C.E. Jr. |
| 2179-2192 |
|
Device Photolithography: Thin Photosensitive Materials |
|
Kerwin, R.E. |
| 2193-2202 |
|
Device Photolithography: A Computer Controlled Coordinate Measuring Machine |
|
Ashley, F.R.; Murphy, Miss E.B.; Savard, H.J. Jr. |
| 2203-2220 |
|
Device Photolithography: The Mask Shop Information System |
|
Brinsfield, Mrs. J.G.; Pardee, S. |
| 2221-2248 |
|
Response of Periodically Varying Systems to Shot Noise - Application to Switched RC Circuits |
|
Rice, S.O. |
| 2249-2265 |
|
A New Approach for Evaluating the Error Probability in the Presence of Intersymbol Interference and Additive Gaussian Noise |
|
Ho, E.Y.; Yeh, Y.S. |
| 2267-2287 |
|
Upper Bound on the Efficiency of dc-Constrained Codes |
|
Chien, Ta-Mu |
| 2289-2302 |
|
Pull-In Range of a Phase-Locked Loop With a Binary Phase Comparator |
|
Oberst, James F. |
| 2303-2310 |
|
A Fast Method of Generating Digital Random Numbers |
|
Rader, C.M.; Rabiner, L.R.; Schafer, R.W. |
| 2311-2348 |
|
Nonorthogonal Optical Waveguides and Resonators |
|
Arnaud, J.A. |
| 2349-2376 |
|
Optical Resonators With Variable Reflectivity Mirrors |
|
Zucker, H. |
| 2377-2403 |
|
Projecting Filters for Recursive Prediction of Discrete-Time Processes |
|
Gersho, Allen; Goodman, David J. |
| 2405-2415 |
|
Contributors to this Issue |
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